A research team has developed a direct optical lithography (DOL) technology that patterns quantum dots (QDs) at ultra-high resolution using only light, without photoresist. Through this, they also provided guidelines for selecting cross-linkers essential for fabricating high-performance QLEDs. This achievement is regarded as a core fundamental technology that can be applied to a wide range of optoelectronic devices, including micro-QLEDs, ultra-high-resolution displays, transparent electronic devices, and next-generation image sensors.